Aneesh Kumar, K. V. and Krishnaveni, S. and Asokan, K. and Ranganathaiah, C. and Ravikumar, H. B. (2018) Comparative study of 150 keV Ar+ and O+ ion implantation induced structural modification on electrical conductivity in Bakelite polymer. Journal of Physics and Chemistry of Solids, 113. 74 - 81. ISSN 0022-3697
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A comparative study of 150 keV argon (Ar+) and oxygen (O+) ion implantation induced microstructural modifications in Bakelite Resistive Plate Chamber (RPC) detector material at different implantation fluences have been studied using Positron Annihilation Lifetime Spectroscopy (PALS). Positron lifetime parameters viz., o-Ps lifetime (τ3) and its intensity (I3) upon lower implantation fluences can be interpreted as the cross-linking and the increased local temperature induced diffusion followed by trapping of ions in the interior polymer voids. The increased o-Ps lifetime (τ3) at higher O+ ion implantation fluences indicates chain scission owing to the oxidation and track formation. This is also justified by the X-Ray Diffraction (XRD) and Fourier Transform Infrared (FTIR) results. The modification in the microstructure and electrical conductivity of Bakelite materials are more upon implantation of O+ ions than Ar+ ions of same energy and fluences. The reduced electrical conductivity of Bakelite polymer material upon ion implantation of both the ions is correlated to the conducting pathways and cross-links in the polymer matrix. The appropriate energy and fluence of implanting ions might reduce the leakage current and hence improve the performance of Bakelite RPC detectors.
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | Ion implantation, RPC detector material, Cross-linking, Free volume, Electrical conductivity |
| Subjects: | D Physical Science > Physics |
| Divisions: | Department of > Physics |
| Depositing User: | Manjula P Library Assistant |
| Date Deposited: | 12 Jul 2019 06:23 |
| Last Modified: | 12 Jul 2019 06:23 |
| URI: | http://eprints.uni-mysore.ac.in/id/eprint/5136 |
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