Effect of argon ion implantation on the microstructure and electrical conductivity of a polymer based bakelite RPC detector material

Aneesh Kumar, K. V. and Munirathnamma, L. M. and Ningaraju, S. and Ranganathaiah, C. and Nambissan, P. M. G. and Ravikumar, H. B. (2017) Effect of argon ion implantation on the microstructure and electrical conductivity of a polymer based bakelite RPC detector material. AIP Conference Proceedings, 1832 (1). ISSN 0094-243X

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Official URL: http://aip.scitation.org/doi/abs/10.1063/1.4980233

Abstract

Positron annihilation lifetime spectroscopy (PALS) and Doppler broadening spectroscopy were used to explore the ion implantation induced microstructural modification and the electrical conductivity of Bakelite Resistive Plate Chamber detector material used in high energy physics experiments. Samples of Bakelite polymers were exposed to 150 keV of argon (Ar) ions in the fluence of 1013 to 1015 ions cm−2. Positron lifetime parameters viz., o-Ps lifetime and its intensity showed decrease in free volume size up on higher implantation fluences indicates the cross linking and filling up of interior voids by the implanted Ar ions. It was found that cross linking in the Bakelite polymer increases significantly with increasing implantation fluences compliment well with the X-Ray Diffraction (XRD) results. The reduction in electrical conductivity of Bakelite material after implantation is also correlated to the conducting pathways and cross links in the polymer matrix. The calculated S parameter exhibits an inverse behavior with the dc electrical conductivity.

Item Type: Article
Additional Information: Unmapped bibliographic data: M3 - doi: 10.1063/1.4980233 [Field not mapped to EPrints] JO - AIP Conference Proceedings [Field not mapped to EPrints]
Subjects: Physical Sciences > Physics
Divisions: PG Campuses > Manasagangotri, Mysore > Physics
Depositing User: Praveen Kumari B.L
Date Deposited: 27 Nov 2017 05:10
Last Modified: 27 Nov 2017 05:10
URI: http://eprints.uni-mysore.ac.in/id/eprint/20251

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